Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors

Sang-Yun Sung; Jun Hyuk Choi; Un Bin Han; Ki Chang Lee; Joon-Hyung Lee; Jeong-Joo Kim; Wantae Lim; Pearton, S. J.; Norton, D. P.; Young-Woo Heo
March 2010
Applied Physics Letters;3/8/2010, Vol. 96 Issue 10, p102107
Academic Journal
We investigated the transfer characteristics and the gate-bias stability of amorphous indium-gallium-zinc oxide thin-film transistors when the channel layer was exposed to hydrogen, oxygen, air, or vacuum at room temperature during measurements. The threshold voltage and the drain current were changed by the ambient atmospheres. The threshold voltage shift (ΔVth) under gate-bias stress was faster in hydrogen than in oxygen and vacuum. It is suggested that hydrogen exposure degrades the gate-bias stress stability due to surface accumulation layer creation. The characteristic trapping times, τ, in H2, O2, air, and vacuum were 5×103, 1.5×104, 2×104, and 6.3×104 s, respectively.


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