Reactive radical facilitated reaction-diffusion modeling for holographic photopolymerization

Jianhua Liu; Haihui Pu; Bin Gao; Hongyue Gao; Dejin Yin; Haitao Dai
February 2010
Applied Physics Letters;2/8/2010, Vol. 96 Issue 6, p061103
Academic Journal
A phenomenological concentration of reactive radical is proposed to take the role of curing light intensity in explicit proportion to the reaction rate for the conventional reaction-diffusion model. This revision rationally eliminates the theoretical defect of null reaction rate in modeling of the postcuring process, and facilitates the applicability of the model in the whole process of holographic photopolymerizations in photocurable monomer and nematic liquid crystal blend system. Excellent consistencies are obtained in both curing and postcuring processes between simulated and experimentally measured evolutions of the first order diffraction efficiency of the formed composite Bragg gratings.


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