High current diffuse dielectric barrier discharge in atmospheric pressure air for the deposition of thin silica-like films

Starostin, S. A.; Premkumar, P. Antony; Creatore, M.; de Vries, H.; Paffen, R. M. J.; van de Sanden, M. C. M.
February 2010
Applied Physics Letters;2/8/2010, Vol. 96 Issue 6, p061502
Academic Journal
The diffuse dielectric barrier discharge in atmospheric pressure air was applied for the thin film deposition on polymeric web in industrially relevant roll-to-roll configuration. The silica-like film deposition was performed using the admixture of hexamethyldisiloxane precursor to air flow. Fast discharge imaging at 2 μs exposure time confirms plasma uniformity in a single current pulse time scale. Morphology and composition analyses indicate that the process results in ultrasmooth films (roughness comparable to initial substrate roughness) and shows the possibility to synthesize carbon-free layers.


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