Superconducting MgB[sub 2] thin films by pulsed laser deposition

Shinde, S. R.; Ogale, S. B.; Greene, R. L.; Venkatesan, T.; Canfield, P. C.; Bud’ko, S. L.; Lapertot, G.; Petrovic, C.
July 2001
Applied Physics Letters;7/9/2001, Vol. 79 Issue 2
Academic Journal
Growth of MgB[sub 2] thin films by pulsed laser deposition is examined under ex situ and in situ processing conditions. For the ex situ process, boron films grown by pulsed laser deposition were annealed at 900 °C with excess Mg. For the in situ process, different approaches involving ablation from a stoichiometric target under different growth conditions, as well as multilayer deposition involving interposed Mg layers were examined and analyzed. Magnetic measurements on ex situ processed films show T[sub c] of ∼39 K, while the current best in situ films show a susceptibility transition at ∼22 K. © 2001 American Institute of Physics.


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