Electrical characteristics of ZrO[sub x]N[sub y] prepared by NH[sub 3] annealing of ZrO[sub 2]

Jeon, Sanghun; Choi, Chel-Jong; Seong, Tae-Yeon; Hwang, Hyunsang
July 2001
Applied Physics Letters;7/9/2001, Vol. 79 Issue 2
Academic Journal
The electrical characteristics of ZrO[sub x]N[sub y] prepared by NH[sub 3] annealing of ZrO[sub 2] were investigated for use in metal–oxide–semiconductor gate dielectric applications. Compared with conventional ZrO[sub 2], ZrO[sub x]N[sub y] exhibits excellent electrical characteristics such as high accumulation capacitance, low leakage current density, and superior thermal stability. Based on high resolution transmission electron microscope analysis of both ZrO[sub 2] and ZrO[sub x]N[sub y] samples which had been annealed at 800 °C for 5 min, the ZrO[sub 2] exhibited a polycrystalline state but the ZrO[sub x]N[sub y] was amorphous in structure. In addition, the thickness of ZrO[sub x]N[sub y] was thinner than that of ZrO[sub 2]. The improvement in electrical characteristics can be explained by the better thermal stability and lower rate of oxidation of ZrO[sub x]N[sub y]. © 2001 American Institute of Physics.


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