TITLE

Stress engineering during metalorganic chemical vapor deposition of AlGaN/GaN distributed Bragg reflectors

AUTHOR(S)
Waldrip, K. E.; Han, J.; Figiel, J. J.; Zhou, H.; Makarona, E.; Nurmikko, A. V.
PUB. DATE
May 2001
SOURCE
Applied Physics Letters;5/21/2001, Vol. 78 Issue 21, p3205
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
In situ stress monitoring has been employed during metalorganic chemical vapor deposition of AlGaN/GaN distributed Bragg reflectors (DBRs). It was found that the insertion of multiple AlN interlayers is effective in converting the tensile growth stress typically observed in this system into compression, thus alleviating the problem of crack generation. Crack-free growth of a 60 pair Al[sub 0.20]Ga[sub 0.80]N/GaN quarter-wavelength DBR was obtained over the entire 2 in. wafer; an accompanying reflectivity of at least 99% was observed near the peak wavelength around 380 nm. © 2001 American Institute of Physics.
ACCESSION #
4715253

 

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