TITLE

Direct three-dimensional patterning using nanoimprint lithography

AUTHOR(S)
Li, Mingtao; Chen, Lei; Chou, Stephen Y.
PUB. DATE
May 2001
SOURCE
Applied Physics Letters;5/21/2001, Vol. 78 Issue 21, p3322
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We demonstrated that nanoimprint lithography (NIL) can create three-dimensional patterns, sub-40 nm T-gates, and air-bridge structures, in a single step imprint in polymer and metal by lift-off. A method based on electron beam lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoimprint lithography for three-dimensional nanostructures has many significant applications such as monolithic microwave integrated circuits and nanoelectromechanical system. © 2001 American Institute of Physics.
ACCESSION #
4715208

 

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