TITLE

Dewetting of resist/metal bilayers in resist stripping processes

AUTHOR(S)
Wu, Yihong; Qiao, Peiwen; Chong, Towchong; Low, Teck-Seng; Xie, Hong; Luo, Ping; Guo, Zaibing; Qiu, Jinjun
PUB. DATE
May 2001
SOURCE
Applied Physics Letters;5/21/2001, Vol. 78 Issue 21, p3361
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We report the observations of dewetting of resist/metal bilayers in a resist stripping process of nanofabrication in O[sub 2] plasma. The initiation of the dewetting process is tentatively associated with local heating caused by surface plasmon induced in metallic nanoparticles or nanowires. The surface patterns thus formed differ substantially from all the dewetting patterns reported so far, and they resemble trees at micrometer scale. The possible mechanism for the formation of this kind striking patterns is discussed and its implication to future nanoelectronics manufacturing is addressed. © 2001 American Institute of Physics.
ACCESSION #
4715195

 

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