Mechanisms for O[sub 2] dissociation during pulsed-laser ablation and deposition

Camposeo, A.; Cervelli, F.; Fuso, F.; Allegrini, M.; Arimondo, E.
April 2001
Applied Physics Letters;4/16/2001, Vol. 78 Issue 16, p2402
Academic Journal
We investigate different dissociation mechanisms for O[sub 2] gas during pulsed-laser ablation and deposition. Mesaurements are carried out by using an in situ diagnostics based on absorption spectroscopy of oxygen gas, with space- and time-resolved capabilities, during laser ablation of a metal alloy target in the presence of an oxygen environment. Data, analyzed as a function of ablation parameters, indicate that two different mechanisms, involving electron collisions and formation of a high-density, high-temperature shock layer, play an important role in producing atomic oxygen which can subsequently react with the ablated species. © 2001 American Institute of Physics.


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