Co cluster coalescence behavior observed by electrical conduction and transmission electron microscopy

Peng, D. L.; Konno, T. J.; Wakoh, K.; Hihara, T.; Sumiyama, K.
March 2001
Applied Physics Letters;3/12/2001, Vol. 78 Issue 11, p1535
Academic Journal
We deposited monodispersed Co clusters with mean diameters d=6, 8.5, and 13 nm on quartz and microgrid substrates using a plasma-gas-condensation-type cluster beam deposition system. The cluster-cluster coalescence behavior of the Co cluster assemblies was investigated by in situ electrical conductivity measurements and ex situ transmission electron microscopy (TEM). The electrical conductivity measurement indicates that, below temperature Tapprox. 100 °C, the Co clusters with d=8.5 nm maintain their original size as deposited at room temperature, while the cluster-cluster coalescence takes place at their interface at T>100 °C. The TEM observation indicates that the morphology of the cluster distribution shows no marked change at substrate temperatures T[sub s]<250 °C. Above T[sub s]=300 °C, the interfacial area of coalesced clusters is crystalline, and has its own orientation, different from that of two connected cluster cores. © 2001 American Institute of Physics.


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