TITLE

Magnetic susceptibility and microstructure of hydrogenated amorphous silicon measured by nuclear magnetic resonance on a single thin film

AUTHOR(S)
Baugh, Jonathan; Han, Daxing; Kleinhammes, Alfred; Wu, Yue
PUB. DATE
January 2001
SOURCE
Applied Physics Letters;1/22/2001, Vol. 78 Issue 4, p466
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
A nuclear magnetic resonance technique for precisely measuring the bulk magnetic susceptibility of micron-thick hydrogenated amorphous silicon (a-Si:H) film is introduced. The large disorder-induced diamagnetic enhancement exhibited by a-Si:H is shown to provide a sensitive bulk measurement for detecting variations in structural order in a-Si:H films. Furthermore, this approach is shown to be effective in revealing the details of microstructure in a-Si:H, including the presence of microstructural anisotropy.
ACCESSION #
4710958

 

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