TITLE

Interface reaction of NiO/NiFe and its influence on magnetic properties

AUTHOR(S)
Yu, G. H.; Chai, C. L.; Zhu, F. W.; Xiao, J. M.; Lai, W. Y.
PUB. DATE
March 2001
SOURCE
Applied Physics Letters;3/19/2001, Vol. 78 Issue 12, p1706
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Ta/NiO/NiFe/Ta multilayers were prepared by rf reactive and dc magnetron sputtering. The exchange coupling field between NiO and NiFe reached 120 Oe. The composition and chemical states at the interface region of NiO/NiFe were studied using the x-ray photoelectron spectroscopy (XPS) and peak decomposition technique. The results show that there are two thermodynamically favorable reactions at NiO/NiFe interface: NiO+Fe=Ni+FeO and 3NiO+2Fe=3Ni+Fe[sub 2]O[sub 3]. The thickness of the chemical reaction as estimated by angle-resolved XPS was about 1-1.5 nm. These interface reaction products are magnetic defects, and we believe that the exchange coupling field H[sub ex] and the coercivity H[sub c] of NiO/NiFe are affected by these defects. © 2001 American Institute of Physics.
ACCESSION #
4710903

 

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