TITLE

High resolution eddy current microscopy

AUTHOR(S)
Lantz, M. A.; Jarvis, S. P.; Tokumoto, H.
PUB. DATE
January 2001
SOURCE
Applied Physics Letters;1/15/2001, Vol. 78 Issue 3, p383
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We describe a sensitive scanning force microscope based technique for measuring local variations in resistivity by monitoring changes in the eddy current induced damping of a cantilever with a magnetic tip oscillating above a conducting sample. To achieve a high sensitivity, we used a cantilever with an FeNdBLa particle mounted on the tip. Resistivity measurements are demonstrated on a silicon test structure with a staircase doping profile. Regions with resistivities of 0.0013, 0.0041, and 0.022 Ω cm are clearly resolved with a lateral resolution of approximately 180 nm. For this range of resistivities, the eddy current induced damping is found to depend linearly on the sample resistivity. © 2001 American Institute of Physics.
ACCESSION #
4710722

 

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