TITLE

Interaction of vacancies with interstitial oxygen in silicon

AUTHOR(S)
Casali, R. A.; Ru¨cker, H.; Methfessel, M.
PUB. DATE
February 2001
SOURCE
Applied Physics Letters;2/12/2001, Vol. 78 Issue 7, p913
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Based on first-principle total-energy calculations, we show that the majority of vacancies are trapped by interstitial oxygen in silicon wafers with a typical oxygen concentration of about 10[sup 18] cm[sup -3]. Vacancies and interstitial oxygen form so called A centers with a binding energy of 1.7±0.4 eV. As a consequence, the density of bound vacancies exceeds the equilibrium density of free vacancies by several orders of magnitude and effective vacancy diffusion coefficients in Si are reduced in comparison to the diffusion coefficient of free vacancies. However, we find that trapping of vacancies alone cannot account for the large discrepancies between previously reported diffusion coefficients for vacancies. © 2001 American Institute of Physics.
ACCESSION #
4710639

 

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