TITLE

Deep submicron microcontact printing on planar and curved substrates utilizing focused ion beam fabricated printheads

AUTHOR(S)
Longo, D. M.; Benson, W. E.; Chraska, T.; Hull, R.
PUB. DATE
February 2001
SOURCE
Applied Physics Letters;2/12/2001, Vol. 78 Issue 7, p981
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Focused ion beam (FIB) fabrication of nanostructured "printheads" is used to extend applications of microcontact printing. Planar and curved printheads are fabricated with feature sizes less than 100 nm over fields of view of order 1 mm2, and transferred to target substrates with spatial resolution of order 200 nm. Analysis of the mechanical and ion optical stabilities of the FIB demonstrates that several hours of printhead fabrication time are possible with nanoscale precision. The rapid prototyping capability of this approach and the large depth of focus in the FIB enable rapid nanoscale patterning of a wide range of surface geometries. © 2001 American Institute of Physics.
ACCESSION #
4710614

 

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