Self-assembled Fe nanowires using organometallic chemical vapor deposition and CaF[sub 2] masks on stepped Si(111)

Lin, J.-L.; Petrovykh, D. Y.; Kirakosian, A.; Rauscher, H.; Himpsel, F. J.; Dowben, P. A.
February 2001
Applied Physics Letters;2/5/2001, Vol. 78 Issue 6, p829
Academic Journal
Linear arrays of 3 nm wide Fe stripes with 15 nm spacing are fabricated by self-assembly. They are formed by photolysis of ferrocene that is selectively adsorbed between CaF[sub 2] stripes. An ultraviolet nitrogen laser removes the organic ligands from ferrocene. Arrays of CaF[sub 2] stripes serve as masks, which are self-assembled on a stepped Si(111) surface. Scanning tunneling microscopy is used to investigate the surface morphology during growth. A generalization of this method to other wire materials is discussed. © 2001 American Institute of Physics.


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