TITLE

Monodispersed, nonagglomerated silicon nanocrystallites

AUTHOR(S)
Suzuki, Nobuyasu; Makino, Toshiharu; Yamada, Yuka; Yoshida, Takehito; Seto, Takafumi
PUB. DATE
April 2001
SOURCE
Applied Physics Letters;4/2/2001, Vol. 78 Issue 14, p2043
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We demonstrate the synthesis of monodispersed, nonagglomerated silicon (Si) nanocrystallites, using an integrated process system composed of a unit for the formation of nanocrystallites by pulsed-laser ablation in an inert background gas, a unit for classification using a differential mobility analyzer (DMA), and a unit for deposition onto a substrate using a nozzle jet. The DMA has been designed to operate under pressures less than 5.0 Torr. We have synthesized nonagglomerated Si nanocrystallites of 3.8 nm mean diameter and 1.2 geometrical standard deviation on carbon thin films using this integrated process system. © 2001 American Institute of Physics.
ACCESSION #
4710178

 

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