TITLE

Alternating fluxes of positive and negative ions from an ion-ion plasma

AUTHOR(S)
Kanakasabapathy, Sivananda K.; Overzet, Lawrence J.; Midha, Vikas; Economou, Demetre
PUB. DATE
January 2001
SOURCE
Applied Physics Letters;1/1/2001, Vol. 78 Issue 1, p22
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Relatively electron-free positive- and negative-ion plasmas (ion-ion plasmas) have been achieved in the afterglow of pulsed-power Cl[sub 2] discharges. The application of a low-frequency (20 kHz) bias voltage phase locked to the source power modulation and synchronous with the ion-ion plasma, resulted in alternating fluxes of positive (Cl[sub 2][sup +]) and negative (Cl[sup -]) ions on a substrate. These results qualitatively agree with a one-dimensional fluid model. This technique to produce alternate irradiations could be used to reduce differential charging-induced damage in high-aspect-ratio etching processes. © 2001 American Institute of Physics.
ACCESSION #
4710143

 

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