Writing a superlattice with light forces

Schulze, Th.; Brezger, B.; Mertens, R.; Pivk, M.; Pfau, T.; Mlynek, J.
May 2000
Applied Physics B: Lasers & Optics;2000, Vol. 70 Issue 5, p671
Academic Journal
Abstract. In atom lithography the conventional roles played by light and matter are reversed. Instead of using a solid mask to pattern a light beam, a mask of light is used to pattern a beam of neutral atoms. In this paper we report the production of different chromium dot arrays with quadratic symmetry. The lattice period depends on the relative polarization and the phase of the two standing waves generating the light mask. A small angular misalignment of the laser beams breaks the high symmetry and a chromium superlattice is written, that is a continuous periodic change between two different quadratic lattices. The structures exhibit lines with a FWHM below 50 nm and clearly separated chromium dots with a FWHM below 70 nm.


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