TITLE

Local chemical states and thermal stabilities of nitrogen dopants in ZnO film studied by temperature-dependent x-ray photoelectron spectroscopy

AUTHOR(S)
Li, X. H.; Xu, H. Y.; Zhang, X. T.; Liu, Y. C.; Sun, J. W.; Lu, Y. M.
PUB. DATE
November 2009
SOURCE
Applied Physics Letters;11/9/2009, Vol. 95 Issue 19, p191903
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Local chemical states and thermal stabilities of N dopants in ZnO:N film are investigated by temperature-dependent x-ray photoelectron spectroscopy. Different types of N local states are detected, including N2 molecules occupying O sites [(N2)O], –NO species, substitutional N atoms in O- and N-rich local environments (α- and β-NO). Compared to the β-NO, the α-NO shows a better thermal stability up to 723 K. However, the transformation from α-NO acceptor to undesirable (N2)O donor occurs above 743 K. The variation of N local states also affects Zn and O binding energies. Photoluminescence studies indicate the shallow acceptor nature of α-NO.
ACCESSION #
45249211

 

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