Measurement of effective electron mass in biaxial tensile strained silicon on insulator

Feste, S. F.; Schäpers, Th.; Buca, D.; Zhao, Q. T.; Knoch, J.; Bouhassoune, M.; Schindlmayr, Arno; Mantl, S.
November 2009
Applied Physics Letters;11/2/2009, Vol. 95 Issue 18, p182101
Academic Journal
We present measurements of the effective electron mass in biaxial tensile strained silicon on insulator (SSOI) material with 1.2 GPa stress and in unstrained SOI. Hall-bar metal oxide semiconductor field effect transistors on 60 nm SSOI and SOI were fabricated and Shubnikov–de Haas oscillations in the temperature range of T=0.4–4 K for magnetic fields of B=0–10 T were measured. The effective electron mass in SSOI and SOI samples was determined as mt=(0.20±0.01)m0. This result is in excellent agreement with first-principles calculations of the effective electron mass in the presence of strain.


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