TITLE

Si nanocrystal p-i-n diodes fabricated on quartz substrates for third generation solar cell applications

AUTHOR(S)
Perez-Wurfl, Ivan; Xiaojing Hao; Gentle, Angus; Dong-Ho Kim; Conibeer, Gavin; Green, Martin. A.
PUB. DATE
October 2009
SOURCE
Applied Physics Letters;10/12/2009, Vol. 95 Issue 15, p153506
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
We fabricated p-i-n diodes by sputtering alternating layers of silicon dioxide and silicon rich oxide with a nominal atomic ratio O/Si=0.7 onto quartz substrates with in situ boron for p-type and phosphorus for n-type doping. After crystallization, dark and illuminated I-V characteristics show a diode behavior with an open circuit voltage of 373 mV. Due to the thinness of the layers and their corresponding high resistivity, lateral current flow results in severe current crowding. This effect is taken into account when extracting the electronic bandgap based on temperature dependent diode I-V measurements.
ACCESSION #
44665163

 

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