TITLE

In situ studies of Al2O3 and HfO2 dielectrics on graphite

AUTHOR(S)
Pirkle, Adam; Wallace, Robert M.; Colombo, Luigi
PUB. DATE
September 2009
SOURCE
Applied Physics Letters;9/28/2009, Vol. 95 Issue 13, p133106
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Deposition of Al2O3 and HfO2 dielectrics on graphite is studied as a route to the formation of a high-κ dielectric on graphene. Electron beam evaporation of metal Al and Hf is followed by a separate oxidation step. Reactive e-beam deposition of HfO2 by introduction of O2 to the deposition chamber is also demonstrated as an alternative to the two-step metal deposition and oxidation approach. We employ in situ x-ray photoelectron spectroscopy to study reactions between the substrate and deposited film and ex situ atomic force microscopy to examine the dielectric film morphology.
ACCESSION #
44449166

 

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