Role of low-frequency power in dual-frequency capacitive discharges

Ahn, S. K.; Chang, H. Y.
September 2009
Applied Physics Letters;9/14/2009, Vol. 95 Issue 11, p111502
Academic Journal
Changes in plasma characteristics depending on low-frequency power in dual-frequency capacitive discharges were found from the measurement of electrical characteristics and electron energy probability functions. It is shown that as the low-frequency (2 MHz) power increases for the fixed high-frequency (27.12 MHz) current, the ion bombardment energy, and the ion flux onto the electrode increase simultaneously. It is also shown that the coupling between the low-frequency power and the ion flux originates from change in electron heating mechanisms when varying the low-frequency power. Depending on the discharge pressure, changes in the collisional electron heating in the bulk plasma and participation of the secondary electron emission in the ionization process are observed.


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