Fabrication of extremely narrow metal wires

Natelson, D.; Willett, R. L.; Willett, R.L.; West, K. W.; West, K.W.; Pfeiffer, L. N.; Pfeiffer, L.N.
September 2000
Applied Physics Letters;9/25/2000, Vol. 77 Issue 13
Academic Journal
A robust technique for fabrication of metal wires with controlled widths substantially below 10 nm is presented. By etching a cleaved molecular-beam epitaxy grown substrate, a mechanical template is produced with surface relief of atomic lateral definition. Using metal deposition and directional ion etching of such a substrate, electrically continuous wires are formed from AuPd alloy with diameters as small as 3 nm and lengths greater than 1 μm. This technique can be used with a variety of materials and makes metallic nanostructures on a previously inaccessible size scale. © 2000 American Institute of Physics.


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