TITLE

Correlation between the gate bias dependence of the probability of anode hole injection and breakdown in thin silicon dioxide films

AUTHOR(S)
Samanta, Piyas; Sarkar, C. K.; Sarkar, C.K.
PUB. DATE
December 2000
SOURCE
Applied Physics Letters;12/25/2000, Vol. 77 Issue 26
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Hole injection from the anode in thin silicon dioxide (SiO[sub 2]) films in n[sup +]-polycrystalline silicon gate-oxide-silicon structures has been theoretically investigated during high-field Fowler-Nordheim electron injection from both substrate (positive gate bias) and gate (negative gate bias). Theoretical results of the gate bias dependence of the probability of anode hole injection per injected electron α[sub h] as a function of electric field or injection current density are shown to be directly correlated to experimentally observed polarity dependence of destructive breakdown in thin SiO[sub 2] films. © 2000 American Institute of Physics.
ACCESSION #
4414851

 

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