Nucleation and growth of carbon nanotubes by microwave plasma chemical vapor deposition

Bower, Chris; Zhou, Otto; Zhu, Wei; Wei Zhu; Werder, D. J.; Werder, D.J.; Jin, Sungho; Sungho Jin
October 2000
Applied Physics Letters;10/23/2000, Vol. 77 Issue 17
Academic Journal
The nucleation and growth of aligned multiwall carbon nanotubes by microwave plasma-enhanced chemical vapor deposition have been studied. The nanotubes nucleate and grow from catalytic cobalt islands on a silicon substrate surface, with both their diameter and length dependent on the size of the cobalt islands. Electron microscopy reveals that the nanotubes grow via a "base growth" mechanism. The nanotubes grow initially at a very rapid and constant rate (∼100 nm/s) that decreases sharply after the catalyst Co particles become fully encapsulated by the nanotubes. We propose a detailed model to explain these experimental observations on nucleation and growth of nanotubes. © 2000 American Institute of Physics.


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