TITLE

X-ray diffraction analysis of the defect structure in epitaxial GaN

AUTHOR(S)
Heinke, H.; Kirchner, V.; Einfeldt, S.; Hommel, D.
PUB. DATE
October 2000
SOURCE
Applied Physics Letters;10/2/2000, Vol. 77 Issue 14
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
High-resolution x-ray diffraction has been used to analyze the type and density of threading dislocations in (001)-oriented GaN epitaxial layers. For this, (00l) and (hkl) Bragg reflections with h or k nonzero were studied, the latter one measured in skew symmetric diffraction geometry. The defect analysis was applied to a variety of GaN layers grown by molecular-beam epitaxy under very different conditions. The outcome is a fundamental correlation between the densities of edge- and screw-type dislocations. � 2000 American Institute of Physics.
ACCESSION #
4412869

Tags: DISLOCATIONS in metals;  GALLIUM nitride;  X-rays -- Diffraction;  CHEMICAL vapor deposition

 

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