TITLE

Quantum point contacts fabricated by nanoimprint lithography

AUTHOR(S)
Martini, Ingo; Eisert, Dominik; Kamp, Martin; Worschech, Lukas; Forchel, Alfred; Koeth, Johannes
PUB. DATE
October 2000
SOURCE
Applied Physics Letters;10/2/2000, Vol. 77 Issue 14
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
The potential of integrating nanoimprint lithography into electronic device fabrication is demonstrated by means of a quantum point contact (QPC). A Si-mold with a split-gate pattern is embossed into a thin polymer film located on top of a modulation-doped GaAs/AlGaAs heterostructure. The split-gates are fabricated by metal evaporation and lift-off. The gate tip separation ranges from 180 nm to 400 nm. Transport studies performed at a temperature of 4.2 K show conductance quantization with varying gate voltages. © 2000 American Institute of Physics.
ACCESSION #
4412836

 

Related Articles

  • Laser writing technique creates 3D polymer structures down to 65nm. Bush, Steve // Electronics Weekly;4/11/2007, Issue 2283, p5 

    The article reports that researchers at Atlanta, Georgia-based Georgia Tech University have demonstrated that a three-dimensional polymer structures can be made without conventional lithography, by directly writing with a laser into a polymerisable liquid. The technique could be used to make...

  • Design of graphene electronic devices using nanoribbons of different widths. Naumis, G. G.; Terrones, M.; Terrones, H.; Gaggero-Sager, L. M. // Applied Physics Letters;11/2/2009, Vol. 95 Issue 18, p182104 

    We present a simple design of a field effect transistor based on graphene nanoribbons, taking advantage of the metallic and semiconductor nature of nanoribbons with different widths. Such device could be constructed by using lithography techniques. The conductance of the proposed device is...

  • Fabrication of sub-50 nm (La,Ba)MnO3 ferromagnetic nanochannels by atomic force microscopy lithography and their electrical properties. Hirooka, Motoyuki; Yanagisawa, Yoshihiko; Kanki, Teruo; Tanaka, Hidekazu; Kawai, Tomoji // Applied Physics Letters;10/16/2006, Vol. 89 Issue 16, p163113 

    The technique of atomic force microscope nanolithography was used to construct robust nano-structures with atomically flat surface of ferromagnetic perovskite manganites down to 30 nm in size over 5 μm long. The resulting (La,Ba)MnO3 nanochannel possessed no lithographic damage and exhibited...

  • Mechanism for stamp collapse in soft lithography. Zhou, W.; Huang, Y.; Menard, E.; Aluru, N. R.; Rogers, J. A.; Alleyne, A. G. // Applied Physics Letters;12/19/2005, Vol. 87 Issue 25, p251925 

    Mechanical collapse of recessed features of relief on elastomeric elements for soft lithography represents an important phenomena for this lithographic technology. By comparing computed and measured shapes of partially collapsed structures, we show that the dominant mechanism for collapse is...

  • Phase Shift Mask Fabrication by Laser Microlens Array Lithography for Periodic Nanostructures Patterning. Zhiqiang Huang; Qun Ying Lin; Minghui Hong // Journal of Laser Micro / Nanoengineering;2010, Vol. 5 Issue 3, p233 

    Laser microlens array (MLA) lithography was used to fabricate arbitrary periodic array of patterns on photoresist. Reactive ion etching (RIE) was then utilized to etch and transfer the patterns down to the fused silica substrate. By controlling the etching process, the etched surface was 180°...

  • Fabrication of sub-12nm thick silicon nanowires by processing scanning probe lithography masks. Yu Kyoung Ryu; Postigo, Pablo Aitor; Garcia, Fernando; Garcia, Ricardo // Applied Physics Letters;6/2/2014, Vol. 104 Issue 22, p1 

    Silicon nanowires are key elements to fabricate very sensitive mechanical and electronic devices. We provide a method to fabricate sub-12 nm silicon nanowires in thickness by combining oxidation scanning probe lithography and anisotropic dry etching. Extremely thin oxide masks (0.3-1.1nm) are...

  • Combinatorial Techniques to Efficiently Investigate and Optimize Organic Thin Film Processing and Properties. Florian Wieberger; Tristan Kolb; Christian Neuber; Ober, Christopher K.; Schmidt, Hans-Werner // Molecules;Apr2013, Vol. 18 Issue 4, p4120 

    In this article we present several developed and improved combinatorial techniques to optimize processing conditions and material properties of organic thin films. The combinatorial approach allows investigations of multi-variable dependencies and is the perfect tool to investigate organic thin...

  • Immersion-Lithography Tool Dives Toward 70-To 45-nm Features.  // Electronic Design;8/23/2004, Vol. 52 Issue 18, p34 

    This article features the MS-193i microexposure device, an immersion lithography tool with an ultra-high numerical aperture and 193-nm wavelength from Exitech Ltd. in the U.S. This device facilitates the development of critical infrastructure for immersion lithography. Immersion lithography...

  • Immersion lithography will boost chip manufacturing... at a cost, warns MD. Bush, Steve; Ball, Richard // Electronics Weekly;6/23/2004, Issue 2152, p7 

    Immersion lithography, phase shift masks and other techniques will push sub-wavelength lithography, but firms should carefully consider the economic trade-off. The warning came from Andre Hawryliw, managing director of mask maker Compugraphics, who spoke at last week's Semiconductor 2004...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics