TITLE

Microstructural analysis of nickel silicide formed by nickel/silicon-on-oxide annealing

AUTHOR(S)
Yang, H.; Pinizzotto, R.F.; Lou, L.; Namavar, F.
PUB. DATE
May 1993
SOURCE
Applied Physics Letters;5/24/1993, Vol. 62 Issue 21, p2694
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Analyzes the microstructures of crystalline nickel (Ni) disilicide thin films on silicon-on-oxide substrates. Formation of nickel silicide films in metallic nickel; Observation of twin boundaries at the silicide/oxide interface; Prevention of Ni diffusion by the oxide layer.
ACCESSION #
4375188

 

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