Interface defects of ultrathin rapid-thermal oxide on silicon

Stathis, J.H.; Buchanan, D.A.; Quinlan, D.L.; Parsons, A.H.; Kotecki, D.E.
May 1993
Applied Physics Letters;5/24/1993, Vol. 62 Issue 21, p2682
Academic Journal
Examines the interface defects in ultrathin silica prepared by rapid-thermal oxidation (RTO). Observation of interface state peak in silicon band gap; Removal of interface state by gas annealing; Difference of interface properties between RTO and furnace oxide.


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