Enhanced production of multicharged boron ions by approaching a boride target to an ECR zone

Kato, Y.; Fukukawa, A.
March 1996
Review of Scientific Instruments;Mar96, Vol. 67 Issue 3, p1177
Academic Journal
Reports on the production of multicharged boron ions by a sputtering boride target in a electron cyclotron resonance (ECR) ion source. Immersion of target material in an ECR argon plasma; Coincidence of boron ion current increase with subtension of the solid angle; Charge state distributions of extracted ion current; Plasma parameters under influence of target insertion.


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