A 16 cm broad-beam ion source for ion-beam etching of quartz wafers

Yusheng Rao; Ming Li; Bo Qi; Fei Li
March 1996
Review of Scientific Instruments;Mar96, Vol. 67 Issue 3, p1009
Academic Journal
Reports on the development of a broad-beam ion source for ion-beam etching of quartz wafers used for resonators with a high basic frequency. Schematic diagram of the ion source; Optimization of the magnetic field configuration; Features of the extraction ion optics system; Roles of the extrusion moulding of grids.


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