Ion sources for implantation application (invited)

Matsuda, Koji; Taniyo, Masayasu
March 1996
Review of Scientific Instruments;Mar96, Vol. 67 Issue 3, p901
Academic Journal
Reports on the development of ion sources for implantation application. Bernas ion source; Electron cyclotron resonance (ECR) ion source; Typical lifetime of the Bernas source; Wide range beam current controllability; Lifetime of the ECR source; Requirements of ion source for implantation application.


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