TITLE

Radio frequency, microwave, and electron cyclotron resonance ion sources for industrial

AUTHOR(S)
Wartski, L.; Schwebel, C.; Aubert, J.
PUB. DATE
March 1996
SOURCE
Review of Scientific Instruments;Mar96, Vol. 67 Issue 3, p895
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Explores different types of ion sources used for specific industrial applications and the future trends in this area. Ion-beam processing; Ion-beam etching; Ion-beam cleaning; Ion-beam deposition; Ion-beam assisted deposition; Automatic control of the source for its utilization in complex processes; Neutralization of the ion beam in a reactive gas environment.
ACCESSION #
4367152

 

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