Analysis of liquid mediated friction during alignment in large area UV imprint lithography

Seock Hwan Kang; Si Hwan Park; Woo Il Lee
August 2009
Applied Physics Letters;8/3/2009, Vol. 95 Issue 5, p053110
Academic Journal
Stiction in large area imprint lithography was studied by a microtribological approach. As imprinting area is expanded, fine aligning movement can be hindered by the adhesion or in-plane friction between the mold and the substrate. In this study, an analytical model for stiction force in the alignment process was proposed and evaluated by measuring the friction force between two plates mediated by a thin liquid film. Experimental verification was conducted for various geometries and surface conditions. Analytic and experimental results demonstrated that the meniscus force induced from surface tension was the most critical parameter affecting stiction in an alignment process.


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