Plasma wakefield klystron

Pasour, J.A.; Seeley, R.; Smithe, D.; Nguyen, K.
August 1997
Review of Scientific Instruments;Aug1997, Vol. 68 Issue 8, p3229
Academic Journal
Describes a microwave source that utilizes a plasma to bunch the electron beam. Components of the plasma wakefield klystron; Interaction of the electron beam with plasma via the wakefield produced by the beam head; Tuning of the device by varying the plasma density.


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