Low-temperature selective-area deposition of metals: Chemical vapor deposition of gold from

Holl, M.M. Banaszak; Seidler, P.F.; Kowalczyk, S.P.; McFeely, F.R.
March 1993
Applied Physics Letters;3/29/1993, Vol. 62 Issue 13, p1475
Academic Journal
Demonstrates the chemical vapor deposition of high purity gold using metallic gold. Confirmation of total selectivity for metallic surfaces in the insulator surfaces; Key growth condition for selectivity; Extension of low temperature selectivity on other precursors.


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