TITLE

Low-temperature selective-area deposition of metals: Chemical vapor deposition of gold from

AUTHOR(S)
Holl, M.M. Banaszak; Seidler, P.F.; Kowalczyk, S.P.; McFeely, F.R.
PUB. DATE
March 1993
SOURCE
Applied Physics Letters;3/29/1993, Vol. 62 Issue 13, p1475
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Demonstrates the chemical vapor deposition of high purity gold using metallic gold. Confirmation of total selectivity for metallic surfaces in the insulator surfaces; Key growth condition for selectivity; Extension of low temperature selectivity on other precursors.
ACCESSION #
4338109

 

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