TITLE

Nanocrystalline Ge in SiO[sub 2] by annealing of Ge[sub x]Si[sub 1-x]O[sub 2] in hydrogen

AUTHOR(S)
Liu, W.S.; Chen, J.S.; Nicolet, M.-A.; Arbet-Engels, V.; Wang, K.L.
PUB. DATE
June 1993
SOURCE
Applied Physics Letters;6/21/1993, Vol. 62 Issue 25, p3321
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Analyzes the nanocrystalline germanium (Ge) synthesis in silicon dioxide by annealing of Ge[sub x]Si[sub 1-x]O[sub 2] in hydrogen. Significance of elemental silicon in the reduction process; Use of transmission electron microscopy in revealing nucleation process homogeneity; Effect of hydrogen annealing on Ge oxidation state.
ACCESSION #
4338078

 

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