Reactive sputtering deposition of low temperature tantalum suboxide thin films

Wu, X.M.; Wu, P.K.; Lu, T.-M.; Rymaszewski, E.J.
June 1993
Applied Physics Letters;6/21/1993, Vol. 62 Issue 25, p3264
Academic Journal
Demonstrates the deposition of low temperature tantalum oxide thin films. Composition of the deposited films; Deposition techniques for tantalum oxide in thin film form; Dependence of the film dielectric constant and current density on oxygen and argon flow rates.


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