TITLE

Reactive sputtering deposition of low temperature tantalum suboxide thin films

AUTHOR(S)
Wu, X.M.; Wu, P.K.; Lu, T.-M.; Rymaszewski, E.J.
PUB. DATE
June 1993
SOURCE
Applied Physics Letters;6/21/1993, Vol. 62 Issue 25, p3264
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Demonstrates the deposition of low temperature tantalum oxide thin films. Composition of the deposited films; Deposition techniques for tantalum oxide in thin film form; Dependence of the film dielectric constant and current density on oxygen and argon flow rates.
ACCESSION #
4338059

 

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