Electrical resistance of electron beam induced deposits from tungsten hexacarbonyl

Hoyle, P.C.; Ogasawara, M.; Cleaver, J.R.A.; Ahmed, H.
June 1993
Applied Physics Letters;6/7/1993, Vol. 62 Issue 23, p3043
Academic Journal
Examines the electrical resistance of electron beam induced dissociation deposits from tungsten hexacarbonyl. Correlation between thickness and line resistance; Theoretical description of the intermediate and final product; Measurement of line resistance with a two-probe arrangement.


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