TITLE

10 nm electron beam lithography and sub-50 nm overlay using a modified scanning electron microscope

AUTHOR(S)
Fischer, P.B.; Chou, S.Y.
PUB. DATE
June 1993
SOURCE
Applied Physics Letters;6/7/1993, Vol. 62 Issue 23, p2989
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the lithographic resolution and overlay capability of a modified scanning tunneling microscope. Width and length of the quantum transistor gates; Utilization of a liftoff process with polymethyl methacrylate resists; Range of overlay accuracy achieved with the technique.
ACCESSION #
4338023

 

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