Photoelastic waveguides formed by interfacial reactions

Yu, L.S.; Guan, Z.F.; Xia, W.; Liu, Q.Z.; Deng, F.; Pappert, S.A.; Yu, P.K.L.; Lau, S.S.; Florez, L.T.; Harbison, J.P.
June 1993
Applied Physics Letters;6/7/1993, Vol. 62 Issue 23, p2944
Academic Journal
Details the fabrication of low-loss photoelastic waveguides in gallium arsenide/aluminum gallium arsenide heterostructures by thin film interfacial reactions. Effect of local tensile stress on refractive index; Stability of the material after thermal annealing.


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