TITLE

Helium-excited reactive magnetron sputtering for stress-free silicon nitride films

AUTHOR(S)
Sugimoto, Iwao; Nakano, Satoko
PUB. DATE
April 1993
SOURCE
Applied Physics Letters;4/26/1993, Vol. 62 Issue 17, p2116
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Evaluates stress-free silicon nitride films by helium-excited reactive magnetron sputtering. Production of highly reactive nitride ions; Increase in plasma reactivity for silicon-nitride bond formation; Reduction in the compressive stress of the reactivity magnetron-sputtered silicon nitride films.
ACCESSION #
4337982

 

Related Articles

  • Characteristics of metal-ferroelectric-insulator-silicon structures with ferroelectric (Pb0.8Ba0.2)ZrO3 thin films and (Ba0.5Sr0.5)TiO3 buffer layer. Chien-Hung Liu; Jenn-Ming Wu; Lin-Jung Wu // Applied Physics Letters;3/20/2006, Vol. 88 Issue 12, p122901 

    The results of the fabrication and characterization of ferroelectric (Pb0.8Ba0.2)ZrO3 (PBZ) thin films grown on nitrided silicon substrates with a (Ba0.5Sr0.5)TiO3 (BST) buffer layer by the rf-magnetron sputtering technique are reported. The PBZ thin films were used as the ferroelectric layer in...

  • Structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering. Cheng, Y. H.; Kupfer, H.; Richter, F.; Giegengack, H.; Hoyer, W. // Journal of Applied Physics;2/1/2003, Vol. 93 Issue 3, p1422 

    A pulsed mid-frequency magnetron sputtering technique was used to deposit MgO films. Atomic force microscopy, Rutherford backscattering, x-ray diffraction, and a diode discharge device were used to characterize surface morphology, oxygen content, crystalline structure, and the secondary electron...

  • Synthesis of Nd(FeTi)[sub 12] films by sputtering. Panagiotopoulos, I.; Wang, D.; Niarchos, D.; Sellmyer, D.J. // Applied Physics Letters;6/28/1993, Vol. 62 Issue 26, p3528 

    Describes the synthesis of neodymium(FeTi)[sub 12] thin films by direct current magnetron sputtering system. Structural characterization by x-ray diffractometry and magnetic measurement; Influence of deposition parameters on phase formation and sputtered film texture; Results of the film...

  • Acoustic investigation of the elastic properties of ZnO films. Carlotti, G.; Socino, G.; Petri, A.; Verona, E. // Applied Physics Letters;12/7/1987, Vol. 51 Issue 23, p1889 

    The elastic properties of ZnO films deposited by rf magnetron sputtering on Al2O3 substrates have been analyzed by means of an acoustic investigation technique. The phase velocities of a spectrum of acoustic modes propagating along the layered structure have been measured and the results...

  • Target presputtering effects on stoichiometry and deposition rate of Y-Ba-Cu-O thin films grown by dc magnetron sputtering. Selinder, T. I.; Larsson, G.; Helmersson, U.; Olsson, P.; Sundgren, J.-E.; Rudner, S. // Applied Physics Letters;5/30/1988, Vol. 52 Issue 22, p1907 

    Y-Ba-Cu-O thin films have been grown from stoichiometric compound targets using dc magnetron sputtering. Initially, the film composition was strongly off-stoichiometric and the deposition rate very low. However, after extensive presputtering, stoichiometric films, with respect to the metal...

  • On-axis dc magnetron sputtering of large area high quality YBa[sub 2]Cu[sub 3]O[sub 7].... Zhang, Y.Z.; Li, L. // Applied Physics Letters;7/20/1992, Vol. 61 Issue 3, p348 

    Examines the in situ preparation of YBa[sub 2]Cu[sub 3]O[sub 7] thin films across the plasma ring by a direct current planar magnetron sputtering method with on-axis sputtering configuration. Reduction of the resputtering effects; Characterization of the thin films; Determination of the...

  • Direct current-94.92 MHz hybrid plasma magnetron sputtering for fabrication of.... Ito, W.; Okayama, S.; Homma, N.; Oishi, A.; Morishita, T. // Applied Physics Letters;1/18/1993, Vol. 62 Issue 3, p312 

    Examines YBa[sub 2]Cu[sub 3]O[sub 7-x] thin films using a designed dc-94.92 MHz hybrid plasma magnetron sputtering system. Implication of the cathode current for film crystalline orientation; Indication of increased emission line intensity through optical emission spectroscopy; Discussion on...

  • In situ ordering of FePt thin films with face-centered-tetragonal (001) texture on Cr[sub 100-x]Ru[sub x] underlayer at low substrate temperature. Xu, Yingfan; Chen, J. S.; Wang, J. P. // Applied Physics Letters;5/6/2002, Vol. 80 Issue 18, p3325 

    In situ ordered FePt thin films with face-centered-tetragonal (fct)-(001) texture have been prepared by magnetron sputtering the FePt layer onto the Cr[sub 100-x]Ru[sub x] underlayer at relatively low temperature. The dependence of FePt texture on the Ru content in the Cr underlayer and the...

  • Electrical properties of highly conducting and transparent thin films of magnetron sputtered SnO2. Goodchild, R. G.; Webb, J. B.; Williams, D. F. // Journal of Applied Physics;3/15/1985, Vol. 57 Issue 6, p2308 

    Presents the results of an investigation on the deposition of the reactive magnetron sputtering of transparent conducting tin oxide thin films of unheated substrates. Information on the potential applications of the thin films; Process involved in the preparation of a typical film; Implication...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics