TITLE

Formation of hexafluorosilicate on Si surface treated in NH[sub 4]F investigated by

AUTHOR(S)
Niwano, Michio; Kurita, Kazunari; Takeda, Yuki; Miyamoto, Nobuo
PUB. DATE
March 1993
SOURCE
Applied Physics Letters;3/1/1993, Vol. 62 Issue 9, p1003
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Investigates the formation of hexafluorosilicate salts on silicon (Si) surface treated with ammonium fluoride (NH[sub 4]F). Use of photoemission and surface infrared spectroscopy; Account on the dominant reaction pathway for NH[sub 4]F etching of Si crystals.
ACCESSION #
4337889

 

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