Formation of hexafluorosilicate on Si surface treated in NH[sub 4]F investigated by

Niwano, Michio; Kurita, Kazunari; Takeda, Yuki; Miyamoto, Nobuo
March 1993
Applied Physics Letters;3/1/1993, Vol. 62 Issue 9, p1003
Academic Journal
Investigates the formation of hexafluorosilicate salts on silicon (Si) surface treated with ammonium fluoride (NH[sub 4]F). Use of photoemission and surface infrared spectroscopy; Account on the dominant reaction pathway for NH[sub 4]F etching of Si crystals.


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