Effect of oxidizing activity on the low-temperature growth of HoBa[sub 2]Cu[sub 3]O[sub x] thin

Tsukamoto, Akira; Hiratani, Masahiko; Akamatsu, Shoichi
June 1993
Applied Physics Letters;6/28/1993, Vol. 62 Issue 26, p3516
Academic Journal
Examines the effect of oxidizing activity on the low-temperature growth of HoBa[sub 2]Cu[sub 3]O[sub x] thin films. Formation of excess oxygen vacancies regardless of plasma application; Comparison between thin films grown in molecular oxygen and oxygen plasma; Discussion of the film growth thermal equilibrium .


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