Strain relaxation and mosaic structure in relaxed SiGe layers

Mooney, P.M.; LeGoues, F.K.; Chu, J.O.; Nelson, S.F.
June 1993
Applied Physics Letters;6/28/1993, Vol. 62 Issue 26, p3464
Academic Journal
Examines strain relaxation and mosaic structure in relaxed silicon germanide (SiGe) alloy layers. Use of high-resolution x-ray diffraction in characterizing strained SiGe layers and superlattices; Determination of the importance of mosaic structure; Discussion on the effect of threading dislocations on the x-ray peak widths.


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