TITLE

Effects of mixing germane in silane gas-source molecular beam epitaxy

AUTHOR(S)
Ki-Joon Kim; Suemitsu, Maki; Yamanaka, Masayoshi; Miyamoto, Nobuo
PUB. DATE
June 1993
SOURCE
Applied Physics Letters;6/28/1993, Vol. 62 Issue 26, p3461
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Examines the effect of mixing germane on silane gas-source molecular beam epitaxy. Deliberation of the properties of ultra-high vacuum chemical vapor deposition; Link between the growth-rate reduction at low temperatures and the increase of the surface hydrogen coverage; Growth mechanism of silicon germanide gas-source.
ACCESSION #
4329801

 

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