Effects of mixing germane in silane gas-source molecular beam epitaxy

Ki-Joon Kim; Suemitsu, Maki; Yamanaka, Masayoshi; Miyamoto, Nobuo
June 1993
Applied Physics Letters;6/28/1993, Vol. 62 Issue 26, p3461
Academic Journal
Examines the effect of mixing germane on silane gas-source molecular beam epitaxy. Deliberation of the properties of ultra-high vacuum chemical vapor deposition; Link between the growth-rate reduction at low temperatures and the increase of the surface hydrogen coverage; Growth mechanism of silicon germanide gas-source.


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