Real-time, in situ monitoring of surface reactions during plasma passivation of GaAs

Aydil, Eray S.; Zhen Zhou; Giapis, Konstantinos P.; Chabal, Yves; Gregus, Jeffrey A.; Gottscho, Richard A.
June 1993
Applied Physics Letters;6/14/1993, Vol. 62 Issue 24, p3156
Academic Journal
Investigates the surface chemistry during gallium arsenide plasma passivation. Application of total reflection Fourier transform infrared spectroscopy; Measurement of bond concentrations as a function of effluent exposure; Use of photoluminescence intensity for surface state reduction.


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