Roughness of the silicon (001)/SiO[sub 2] interface

Mau-Tsu Tang; Evans-Lutterodt, K.W.; Higashi, G.S.; Boone, T.
June 1993
Applied Physics Letters;6/14/1993, Vol. 62 Issue 24, p3144
Academic Journal
Examines the roughness of the buried silicon(001)/silicon dioxide interface using synchrotron x-ray diffraction. Comparison between thermal and native oxide interface; Measurement of chemically grown oxide interface roughness; Analysis of the interface width.


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